Analysis on machining uniformity in reciprocating magnetorheological polishing based on abrasive particle trajectory

Author:

Wang Rensheng,Sun Cong,Xiu Shichao,Wang Qi,Liang Dongming,Zhao Qi

Abstract

Purpose This paper aims to study the effects of the processing parameters in the reciprocating magnetorheological polishing (RMRP) on abrasive particle trajectory by the simulation analysis, which provides a basis for the machining uniformity of the workpiece. Design/methodology/approach The principle of the RMRP method is discussed, and a series of simulation analysis of the abrasive particle trajectory are performed to evaluate the effects of the workpiece’s rotational speed, the eccentric wheel’s rotational speed, the eccentricity and the frame gap on abrasive particle trajectory by using the RMRP method. Findings The processing parameters have a significant influence on the abrasive particle trajectory, and then the machining uniformity of the workpiece is affected. Under certain experimental conditions, the height difference of workpiece measuring points varies between 4 and 11 µm, and the height difference of equal radial measuring points is less than 1.5 µm by optimizing processing parameters. Originality/value In this study, the optimal processing parameters can be obtained by the simulation analysis of abrasive particle trajectory, which can replace the experimental methods to obtain the reasonable processing parameters for the machining uniformity of the workpiece. It provides references for the selection of processing parameter values in magnetorheological polishing process.

Publisher

Emerald

Subject

Surfaces, Coatings and Films,General Energy,Mechanical Engineering

Reference16 articles.

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4. Selection of optimum polishing fluid composition for ball end magnetorheological finishing (BEMRF) of copper;The International Journal of Advanced Manufacturing Technology,2019

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Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analysis on abrasive particle trajectory in reciprocating magnetorheological polishing;Fifth International Conference on Optoelectronic Science and Materials (ICOSM 2023);2024-02-01

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