Author:
Kumari Satchi,Khare Alika
Abstract
AbstractIn the present paper, measurement of various plasma parameters during pulsed laser deposition of ruby thin film on quartz substrate is reported. The variation of electron temperature and ion density with laser fluence and ambient pressure is recorded via Langmuir probe technique. The structural and optical properties of ruby thin films were analyzed using photo-luminescence and atomic force microscopy, and then correlated with the plasma parameters to find optimum conditions for deposition of high quality ruby thin film.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics
Cited by
3 articles.
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