Depth Profiles of Nitrogen and Chlorine in Pure Materials Through AMS of the Neutron Activation Products 14C and 36Cl

Author:

Elmore David,Hossain T Z,Gove H E,Hemmick T K,Kubik P W,Jiang S,Vine J P La,Lee S T

Abstract

Determination of the more common light elements such as nitrogen and chlorine at trace levels is difficult because of their high abundance on sample surfaces, in materials used to build analysis instruments, and in the residual gas of the instrument vacuum. We present here a new approach to analysis of these elements: accelerator mass spectrometry (AMS) combined with neutron activation. The problem of contamination is overcome by using neutron activation to produce long-lived radioisotopes which generally have low concentrations in the environment. For measurement of 14N and 35Cl, AMS can provide sensitive background-free measurements of their neutron activation products 14C and 36Cl and, in addition, can provide depth profiles. These are the first results of this new method: depth profiles of nitrogen and chlorine implanted in semiconductor grade silicon.

Publisher

Cambridge University Press (CUP)

Subject

General Earth and Planetary Sciences,Archeology

Reference11 articles.

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Trace Element Accelerator Mass Spectrometry;Characterization of Materials;2012-10-12

2. Trace Element Accelerator Mass Spectrometry;Characterization of Materials;2002-10-15

3. AMS studies of the diffusion of chlorine in silicon wafers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-05

4. Anomalous Diffusion of Implanted Chlorine in Silicon;MRS Proceedings;1994

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