Author:
BUGAEV A.S.,VIZIR A.V.,GUSHENETS V.I.,NIKOLAEV A.G.,OKS E.M.,YUSHKOV G.Yu.,BURACHEVSKY Yu.A.,BURDOVITSIN V.A.,OSIPOV I.V.,REMPE N.G.
Abstract
This paper is devoted to the engineering embodiment of the
modern methods for producing charged ion and electron beams
by extracting them from the plasma of a discharge. Electron
beams use to execute electron-beam welding, annealing, and surface
heating of materials and to realize plasmochemical reactions
stimulated by fast electrons. Ion beams allow realization of
technologies of ion implantation or ion-assisted deposition
of coatings thereby opening new prospects for the creation of
compounds and alloys by the method that makes it possible to
obtain desired parameters and functional properties of the surface.
A detailed description is given to the performance and design
of devices producing beams of this type: the ion and electron
sources being developed at the laboratory of plasma sources
of the Institute of High-Current Electronics of the Russian
Academy of Sciences and the laboratory of plasma electronics
of Tomsk State University of Control Systems and Radioelectronics.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics
Cited by
18 articles.
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