Author:
Demers Hendrix,Gauvin Raynald
Abstract
The microanalysis of nonconductive specimen in a scanning electron
microscope is limited by charging effects. Using a charge density model
for the electric field buildup in a nonconductive specimen irradiated
by electrons, a Monte Carlo simulation method has been applied to
alumina (Al2O3). The results show a change in the
depth distribution for characteristic and bremsstrahlung X-ray,
φ(ρz) curves, and ψ(ρz) curves
(with absorption) for both elements' Kα lines. The
influence of the electric field on the measured X-ray intensity is
shown. The dependency of this influence by the three parameters,
electron energy, X-ray energy, and charge density, is clarified.
Publisher
Cambridge University Press (CUP)
Reference15 articles.
1. Kotera, M. & Suga, H. (1988).A simulation of keV electron scatterings in a charged-up specimen.J Appl Phys 78,261–268.
2. Demers, H. (2002).Les effets de charges pour un échantillon isolant dans unmicroscope électronique à balayage.Master's thesis,Université de Sherbrooke.
3. Odof, S. (2000).Microanalyse X des Isolants: Simulations de Monte Carlo.Ph.D. thesis,Université de Reims Champagne-Ardenne.
4. Gray, C.C. , Chapman, J.N. , Nicholson, W.A.P. , Robertson, B.W. , & Ferrier, R.P. (1983).X-ray production in thin films by electrons with energies between40 and 100 keV: 2—Characteristic cross-sections and the overallX-ray spectrum.X-ray Spectrom 12,163–169.
5. Sorbier, L. (2001).Apport de la Simulation dans l'Optimisation de l'AnalyseQuantitative par Microsonde Électronique de CatalyseursHétérogènes,Ph.D. thesis,Université de Montpellier II.
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