Study of n-SnO2/p-Si Heterostructures Fabricated by Chemical Vapor Deposition Methods
Author:
Publisher
Allerton Press
Subject
Renewable Energy, Sustainability and the Environment
Link
https://link.springer.com/content/pdf/10.3103/S0003701X21010114.pdf
Reference21 articles.
1. Chen, X., Liang, J., Zhou, Z., et al., The preparation of SnO2 film by electrodeposition, Mater. Res. Bull., 2010, vol. 45, no. 12, pp. 2006–2011. https://doi.org/10.1016/j.materresbull.2010.07.029
2. Korotkov, R.Y., Ricou, P., Farran, A.J.E., Preferred orientations in polycrystalline SnO2 films grown by atmospheric pressure chemical vapor deposition, Thin Solid Films, 2006, vol. 502, nos. 1–2, pp. 79–87. https://doi.org/10.1016/j.tsf.2005.07.248
3. Ruske, M., Bräuer, G., Pistner, J., et al., Properties of SnO2 films prepared by DC and MF reactive sputtering, Thin Solid Films, 1999, vol. 351, nos. 1–2, pp. 146–150. https://doi.org/10.1016/S0040-6090(99)00083-8
4. Leng, D., Wu, L., Jiang, H., et al., Preparation and properties of SnO2 film deposited by magnetron sputtering, Int. J. Photoenergy, 2012, vol. 2012, art. id. 235971. https://doi.org/10.1155/2012/235971
5. Hsu, P.C., Hsu, C.J., Chang, C.-H., et al., Sputtering deposition of P-type SnO films with SnO2 target in hydrogen-containing atmosphere, ACS Appl. Mater. Interfaces, 2014, vol. 6, no. 16, pp. 13724–13729. https://doi.org/10.1021/am5031787
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