3D Visualization of the Effect of Plasma Temperature on Thin-Film Morphology
Author:
Publisher
Allerton Press
Subject
Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.3103/S1068335623010037.pdf
Reference17 articles.
1. Bouazza, A., Sputtering of semiconductors, conductors, and dielectrics for the realization of electronics components thin-films, Int. J. Thin Film Sci. Technol., 2022, vol. 11, no. 2, pp. 225–232. https://doi.org/10.18576/ijtfst/110210
2. Refas, S.E.C., Bouazza, A., and Belhadji, Y., 3D sputtering simulations of the CZTS, Si and CIGS thin films using Monte-Carlo method, Monte Carlo Methods Appl., 2021, vol. 27, no. 4, pp. 373–382. https://doi.org/10.1515/mcma-2021-2094
3. Bouazza, A. and Settaouti, A., Monte Carlo simulation of the influence of pressure and target-substrate distance on the sputtering process for metal and semiconductor layers, Mod. Phys. Lett. B, 2016, vol. 30, no. 20, pp. 1–18. https://doi.org/10.1142/S0217984916502535
4. Bouazza, A. and Settaouti, A., Study and simulation of the sputtering process of material layers in plasma, Monte Carlo Methods Appl., 2016, vol. 22, no. 2, pp. 149–159. https://doi.org/10.1515/mcma-2016-0106
5. Bouazza, A. and Settaouti, A., Understanding the contribution of energy and angular distribution in the morphology of thin films using Monte Carlo simulation, Monte Carlo Methods Appl., 2018, vol. 24, no. 3, pp. 215–224. https://doi.org/10.1515/mcma-2018-0019
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