An extreme ultraviolet radiation source based on plasma heated by millimeter range radiation-Reference-Cited by-同舟云学术

An extreme ultraviolet radiation source based on plasma heated by millimeter range radiation

Published:2011-01 Issue:1 Volume:75 Page:64-66
ISSN:1062-8738
Container-title:Bulletin of the Russian Academy of Sciences: Physics
language:en
Short-container-title:Bull. Russ. Acad. Sci. Phys.

Author:

Vodopyanov A. V.,Golubev S. V.,Mansfeld D. A.,Salashchenko N. N.,Chkhalo N. I.

Publisher

Allerton Press

Subject

General Physics and Astronomy

Link

http://link.springer.com/content/pdf/10.3103/S1062873811010266.pdf

Reference18 articles.

1. EUV Sources for Lithography, Bakshi, V., Ed., SPIE Soc. of Photo-Optical Instrumentation Eng., 2005.

2. Schriever, G., Rahe, M., Stamm, U., et al., SPIE, 2001, vol. 4343, p. 615.

3. Stamm, U., Ahmad, I., Balogh, I., et al., SPIE, 2003, vol. 5037, p. 119.

4. Koshelev, K.N., Banin, V.E., and Salashchenko, N.N., Usp. Fiz. Nauk, 2007, vol. 177, p. 777.

5. Brandt, D.C., Fomenkov, I.V., Bowering, N.R., et al., Proc. SEMATECH EUVL Symp., Barcelona, 2006, Available from: http://www.sematech.org/meetings/archives/litho/7870/proceedings/oral/D2/3SO04%20Brandt.pdf

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