Prospects of extreme ultraviolet radiation sources based on microwave discharge for high-resolution lithography
Author:
Affiliation:
1. Institute of Applied Physics of the Russian Academy of Sciences, Ulyanova str. 46, 603950 Nizhny Novgorod, Russia
Funder
Russian Science Foundation (RSF)
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4993596
Reference34 articles.
1. Lithography gets extreme
2. EUV Sources for Lithography
3. Multilayer optics for XUV spectral region: technology fabrication and applications
4. High-resolution spectrum of xenon ions at 134 nm
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2. Extreme Ultraviolet Radiation Source Based on a Discharge Sustained by a Radiation Pulse from a Terahertz Free-Electron Laser;Journal of Experimental and Theoretical Physics;2021-02
3. Investigation of ion acceleration effect influence on formation of ambipolar potential profile in the expander region;Review of Scientific Instruments;2020-01-01
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