Author:
Lakshmi Kanth Konuru S.,Umasankar V.,Kumar Sarma Arun
Abstract
Nanostructured Tungsten (W) and Tungsten-Tantalum (W-25% Ta) thin films are generated on Reduced Activation Ferritic Martensitic (RAFM) steel substrates. The developed thin films are then analysed for their adhesive strength, hardness and elastic modulus properties. The addition of Tantalum by 25% as a composite material in Tungsten thin-film coating has increased the ductility and decreased the hardness of the film at room temperature condition. Tantalum addition has decreased the adhesion capability of the Tungsten film to the steel substrate. In this study, adhesion analysis is qualitatively assessed by indentation test, and hardness along with modulus are calculated using nanoindentation test.
Publisher
Informatics Publishing Limited
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Surfaces and Interfaces
Cited by
2 articles.
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