Examining the design characteristics of a dual-material gate all-around tunnel FET for use in biosensing applications
Author:
Affiliation:
1. International Research Centre, Sathyabama Institute of Science and Technology , Chennai , India
2. Sri Krishna College of Technology , Chennai , India
Abstract
Publisher
Walter de Gruyter GmbH
Subject
Physical and Theoretical Chemistry
Link
https://www.degruyter.com/document/doi/10.1515/zpch-2023-0476/pdf
Reference7 articles.
1. Pal, A., Sarkar, A. Analytical study of dual material gate all around MOSFET to suppress short channel effects (SCEs). Int. J. Eng. Sci. Technol. 2014, 17, 205–212; https://doi.org/10.1016/j.jestch.2014.06.002.
2. Mondol, K., Hasan, M., Siddique, A. H., Islam, S. Quantization, gate dielectric and channel length effect in double-gate tunnel field-effect transistor. Results Phys. 2022, 34, https://doi.org/10.1016/j.rinp.2022.105312.
3. Hu, G., Xiang, P., Ding, Z., Liu, R., Wang, L., Tang, T. A. Analytical models for electric potential, threshold voltage, and subthreshold swing of junctionless surrounding-gate transistors. IEEE Trans. Electron Devices 2014, 61, 688–695; https://doi.org/10.1109/TED.2013.2297378.
4. Kumar, M. J., Orouji, A. A., Dhakad, H. New dual-material SG nanoscale MOSFET: analytical threshold-voltage model. IEEE Trans. Electron Devices 2006, 53, 920–922; https://doi.org/10.1109/TED.2006.870422.
5. Preethi, S., Balamurugan, N. B. Analytical modeling of gate all around junctionless MOSFET using finite differentiation method. Silicon 2021, 13, 2921–2931; https://doi.org/10.1007/s12633-020-00653-5.
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3