Alpha spectrometric characterization of thin 233U sources for 229(m)Th production
Author:
Haas Raphael1234ORCID, Hufnagel Michelle1, Abrosimov Roman1, Düllmann Christoph E.1234, Krupp Dominik5, Mokry Christoph12, Renisch Dennis12, Runke Jörg13, Scherer Ulrich W.5
Affiliation:
1. Department of Chemistry - TRIGA Site , Johannes Gutenberg University Mainz , 55099 Mainz , Germany 2. Helmholtz Institute Mainz , 55099 Mainz , Germany 3. GSI Helmholtzzentrum für Schwerionenforschung GmbH , 64291 Darmstadt , Germany 4. PRISMA Cluster of Excellence, Johannes Gutenberg University Mainz , 55099 Mainz , Germany 5. Institut für Physikalische Chemie und Radiochemie, Hochschule Mannheim – University of Applied Sciences , 68163 Mannheim , Germany
Abstract
Abstract
Four different techniques were applied for the production of 233U alpha recoil ion sources, providing 229Th ions. They were compared with respect to a minimum energy spread of the 229Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting 228Th recoil ions from 232U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.
Funder
Helmholtz Initiative and Networking Fund
Publisher
Walter de Gruyter GmbH
Subject
Physical and Theoretical Chemistry
Reference39 articles.
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