Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization
Author:
Publisher
Walter de Gruyter GmbH
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Link
https://www.degruyter.com/view/j/aot.2012.1.issue-4/aot-2012-0037/aot-2012-0037.pdf
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