High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography-Reference-Cited by-同舟云学术

High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Published:2021-07-23 Issue:14 Volume:10 Page:3759-3768
ISSN:2192-8614
Container-title:Nanophotonics
language:en
Short-container-title:

Author:

Kabouraki Elmina¹,Melissinaki Vasileia¹,Yadav Amit²,Melninkaitis Andrius³⁴,Tourlouki Konstantina⁵,Tachtsidis Theodoros⁵,Kehagias Nikolaos⁵⁶^ORCID,Barmparis Georgios D.⁷,Papazoglou Dimitris G.¹⁸,Rafailov Edik²,Farsari Maria¹^ORCID

Affiliation:

1. FORTH/IESL , N. Plastira 100 , Heraklion 70013 , Greece

2. Optoelectronics and Biomedical Photonics Group, AIPT , Aston University , Birmingham B4 7ET , UK

3. Laser Research Center , Vilnius University , Saulėtelio al. 10 , Vilnius 10223 , Lithuania

4. Lidaris Ltd. , Saulėtekio al. 10 , Vilnius LT-10223 , Lithuania

5. Nanotypos , VEPE Technopoli Thessaloniki, Building C2, Pylea , Thessaloniki 55535 , Greece

6. NCSR Demokritos , Institute of Nanoscience and Nanotechnology , P. Grigoriou 27 & Neapoleos Str. , Ag. Paraskevi 15341 , Greece

7. Physics Department , University of Crete , Heraklion 70013 , Greece

8. Materials Science and Technology Department , University of Crete , Heraklion 70013 , Greece

Abstract

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

Publisher

Walter de Gruyter GmbH

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Biotechnology

Link

https://www.degruyter.com/document/doi/10.1515/nanoph-2021-0263/pdf

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