The Increasing Importance of the Use of Ozone in the Microelectronics Industry-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The Increasing Importance of the Use of Ozone in the Microelectronics Industry

Published:2002-01 Issue:5 Volume:24 Page:379-390
ISSN:0191-9512
Container-title:Ozone: Science & Engineering
language:en
Short-container-title:Ozone: Science & Engineering

Author:

De Smedt F.,De Gendt S.,Claes M.,Heyns M.M.,Vankerckhoven H.,Vinckier C.

Publisher

Informa UK Limited

Subject

Environmental Chemistry,Environmental Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/01919510208901628

Reference35 articles.

1. Suffet I.H. , Anselme C. and Mallevialle J. , Conference Proceedings AWWA Seminar on ozonation: recent advances and research needs , ( Denver , CO , 1986 )

2. private communication, IMEC

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dry cleaning of InSb surfaces by hydrogen molecule exposure in ultrahigh vacuum;Applied Surface Science;2024-12

2. Bridging the gap between surface physics and photonics;Reports on Progress in Physics;2024-03-06

3. Ozone: A Valuable Tool for Addressing Today’s Environmental Issues. A Review of Forty-Five Years of Ozone: Science & Engineering;Ozone: Science & Engineering;2023-11-27

4. Effects of Ultrahigh Vacuum Treatments on Wet Chemically Cleaned Si Surfaces;Solid State Phenomena;2023-08-14

5. Atomic Level Chemical and Structural Properties of Silicon Surface and Initial Stages of Oxidation;Solid State Phenomena;2023-08-14

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP