Dielectric relaxation and charge transport mechanisms in (Ba,Sr)TiO3 thin films
Author:
Affiliation:
1. a Infineon Technologies AG , 81730, Munich, Germany
2. b IFF, Research Center Juelich , 52425, Juelich, Germany
3. c Institut fuer Allgemeine Physik, Vienna University of Technology , 1040, Vienna, Austria
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/10584580108016938
Reference19 articles.
1. Progress in the developments of (Ba,Sr)TiO3 (BST) thin films for Gigabit era DRAMs
2. Leakage and interface engineering in titanate thin films for non-volatile ferroelectric memory and ulsi drams
3. Electrode-dielectric interface in thin-film DRAMs for ULSI
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