Architecture and control of a high current ion implanter system-Reference-Cited by-同舟云学术

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Architecture and control of a high current ion implanter system

Published:1979-01 Issue:1-4 Volume:44 Page:167-171
ISSN:0033-7579
Container-title:Radiation Effects
language:en
Short-container-title:Radiation Effects

Author:

Bayer E. H.,Paul L. F.,Kranik J. R.

Publisher

Informa UK Limited

Subject

General Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/00337577908245990

Reference2 articles.

1. Dearnaley, G., Freeman, J. H., Nelson, R. S. and Stephen, J. 1973.Ion Implantation., 421Amsterdam: North-Holland Publishing Co.

2. The design philosophy for a 200 kV industrial high current ion implanter

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Control techniques for a high current ion implantation system;Nuclear Instruments and Methods in Physics Research;1981-10

2. Development of a prototype high-current low-energy ion implanter;Radiation Effects;1979-01

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