Raman scattering study of ion bombardment induced amorphization of SiC
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577708233096
Reference32 articles.
1. Crowder, B. L., Smith, J. E. Jr., Brodsky, M. H. and Nathan, M. I. 1971.Ion Implantation in Semiconductors, Edited by: Ruge, I. and Graul, J. 255New York: Springer-Verlag.
2. RAMAN SCATTERING OF ION‐IMPLANTED GaAs
3. Multiphonon Raman Spectrum of Silicon
4. Raman study of the vibrational properties of implanted silicon
5. Raman-scattering study of ion-implantation-produced damage inCu2O
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