The dose dependence of 45 keV V+and Bi+Ion sputtering yield of copper
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577308232257
Reference17 articles.
1. Sputtering experiments in the high energy region
2. The Z1dependence of heavy-ion sputtering yield in copper
3. The formation of precipitate phases in aluminium by ion implantation
4. Cone Formation on Metal Targets during Sputtering
5. Microtopography of surfaces eroded by ion-bombardment
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2. High dose uranium ion implantation into silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1988-06
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