Variation of the sputtering yield of gold with ion dose-Reference-Cited by-同舟云学术

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Variation of the sputtering yield of gold with ion dose

Published:1973-01 Issue:1-2 Volume:18 Page:119-125
ISSN:0033-7579
Container-title:Radiation Effects
language:en
Short-container-title:Radiation Effects

Author:

Colligon J. S.,Hicks C. M.,Neokleous A. P.

Publisher

Informa UK Limited

Subject

General Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/00337577308234726

Reference10 articles.

1. Colligon, J. S. and Bramham, R. W. 1970.Atomic Collision Phenomena in Solids, Edited by: Palmer, D. W., Thompson, M. W. and Townsend, P. D. 258–265. North-Holland Pub. Co.

2. The Z1dependence of heavy-ion sputtering yield in copper

3. PhD thesis;Bayly A. R.,1970

4. Influence of contaminants on the surface self-diffusion coefficient of gold

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1. Thin Films;Surface and Interface Science;2020-01-17

2. Sputtering yields of tantalum by hydrogen ions in the energy range of 3–11 keV;Radiation Effects and Defects in Solids;2019-02

3. Physical Sputtering and Sputter Deposition;The Foundations of Vacuum Coating Technology;2018

4. References;The Foundations of Vacuum Coating Technology;2003

5. Ion sputtering and its biomedical applications. Theoretical concepts and practical consequences. Clinical implications and potential use;Journal of Materials Science;1985-05

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