Ion implantation in compound semiconductors–an approach based on solid state theory

Author:

Heckingbottom R.,Ambridge T.

Publisher

Informa UK Limited

Subject

General Engineering

Cited by 81 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Review—Dopant Selection Considerations and Equilibrium Thermal Processing Limits for n+-In0.53Ga0.47As;ECS Journal of Solid State Science and Technology;2016

2. Ion beam synthesis and n-type doping of group III Nx V1 xalloys;Semiconductor Science and Technology;2002-07-09

3. Formation of diluted III–V nitride thin films by N ion implantation;Journal of Applied Physics;2001-09

4. Increased electrical activation in the near-surface region of sulfur and nitrogen coimplanted GaAs;Applied Physics Letters;2000-11-27

5. Zinc and group V element co-implantation in indium phosphide;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-05

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