Performance analysis of single EWMA controller subject to metrology delay under dynamic models-Reference-Cited by-同舟云学术

Performance analysis of single EWMA controller subject to metrology delay under dynamic models

Published:2018-01-08 Issue:2 Volume:50 Page:88-98
ISSN:2472-5854
Container-title:IISE Transactions
language:en
Short-container-title:IISE Transactions

Author:

Gong Qingsong¹,Yang Genke¹,Pan Changchun²,Chen Yuwang³

Affiliation:

1. Department of Automation, School of Electronics, Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, P.R. China

2. Academy of Information Technology and Electrical Engineering, School of Electronics, Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, P.R. China

3. Management Science and Marketing Division, Alliance Manchester Business School, University of Manchester, Manchester, UK

Publisher

Informa UK Limited

Subject

Industrial and Manufacturing Engineering

Link

https://www.tandfonline.com/doi/pdf/10.1080/24725854.2017.1386338

Reference34 articles.

1. Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure

2. Run by run control of chemical-mechanical polishing

3. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry

4. Age-based double EWMA controller and its application to CMP processes

5. Deterministic and stochastic model based run-to-run control for batch processes with measurement delays of uncertain duration

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