Run by run control of chemical-mechanical polishing-Reference-Cited by-同舟云学术

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Run by run control of chemical-mechanical polishing

Published:1996-10 Issue:4 Volume:19 Page:307-314
ISSN:1083-4400
Container-title:IEEE Transactions on Components, Packaging, and Manufacturing Technology: Part C
language:
Short-container-title:IEEE Trans. Comp., Packag., Manufact. Technol. C

Author:

Boning D.S.,Moyne W.P.,Smith T.H.,Moyne J.,Telfeyan R.,Hurwitz A.,Shellman S.,Tayor J.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

General Engineering

Link

http://xplorestaging.ieee.org/ielx1/3476/12177/00558560.pdf?arnumber=558560

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