Numerical Simulation of Laser-Produced Plasma Devices for EUV Lithography Using the Heights Integrated Model
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Numerical Analysis
Link
http://www.tandfonline.com/doi/pdf/10.1080/10407780500324996
Reference28 articles.
1. Progress in the ASML EUV program
2. EUV source power and lifetime: the most critical issues for EUV lithography
3. HEIGHTS initial simulation of discharge-produced plamsa hydrodynamics and radiation transport for EUV lithography
4. HEIGHTS initial simulation of discharge produced plasma hydrodynamics and radiation transport for extreme ultraviolet lithography
5. Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices
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