Self-consistent integrated modeling of combined hybrid discharge-laser produced plasma devices for extreme ultraviolet metrology

Author:

Sizyuk Valeryi1ORCID,Hassanein Ahmed1ORCID,Melsheimer Florian23ORCID,Juschkin Larissa2ORCID,Sizyuk Tatyana4ORCID

Affiliation:

1. CMUXE, Purdue University 1 , 500 Central Drive, West Lafayette, Indiana 47907, USA

2. KLA Corporation, Three Technology Drive 2 , Milpitas, California 95035, USA

3. RWTH Aachen University 3 , 55 Templergraben, Aachen 52056, Germany

4. Argonne National Lab 4 , 9700 S. Cass Avenue, Lemont, Illinois 60439, USA

Abstract

Discharge- and laser-produced plasma (DLPP) devices are being used as light sources for extreme ultraviolet (EUV) generation. A key challenge for both, DPP and LPP, is achieving sufficient brightness to support the throughput requirements of nanometrology tools. To simulate the environment of a hybrid DLPP device and optimize the EUV output, we have developed an integrated HEIGHTS-DLPP computer simulation package. The package integrates simulation of two evolving plasmas (DPP and LPP) and includes modeling of a set of integrated self-consistent processes: external power source and plasma energy balance, plasma resistive magnetohydrodynamics, plasma heat conduction, detailed radiation transport (RT), and laser absorption and refraction. We simulated and optimized DLPP devices using Xe gas as a target material. We synchronized the external circuit parameters, chamber gas parameters, and laser beam temporal and spatial profiles to achieve maximum EUV output. The full 3D Monte Carlo scheme was integrated for detailed RT and EUV output calculations in Xe using more than 3600 spectral groups. The modeling results are in good agreement with Julich Forschungszentrum experimental data. Theoretical models, developed and integrated into the HEIGHTS package, showed wide capabilities and flexibility. The models and package can be used for optimization of the experimental parameters and settings, investigation of DLPP devices with complex design, analyzing the impact of integrated spatial effects and working timeline arrangement on the final EUV output, and EUV source size, shape, and angular distribution.

Funder

KLA Corporation

Intel Corporation

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Material removal model for describing the plasma discharge effect in magnetic-electrolytic plasma polishing;The International Journal of Advanced Manufacturing Technology;2024-03-01

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