Composition and conduction properties of silicon nitrides deposited by plasma-enhanced ultra-high-vacuum chemical vapour deposition
Author:
Affiliation:
1. a University of Illinois at Urbana-Champaign, Materials Research Laboratory and Coordinated Science Laboratory , 104 South Goodwin Avenue, Urbana , Illinois , 61801 , USA
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642819608239155
Reference40 articles.
1. Charge trapping in silicon-rich Si3N4 thin films
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4. Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics
5. Low hydrogen content silicon nitride films from electron cyclotron resonance plasmas
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