In-SituMeasurements of Charged Nanoparticles Generated During Hot Wire Chemical Vapor Deposition of Silicon Using Particle Beam Mass Spectrometer-Reference-Cited by-同舟云学术

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In-SituMeasurements of Charged Nanoparticles Generated During Hot Wire Chemical Vapor Deposition of Silicon Using Particle Beam Mass Spectrometer

Published:2013-01 Issue:1 Volume:47 Page:46-51
ISSN:0278-6826
Container-title:Aerosol Science and Technology
language:en
Short-container-title:Aerosol Science and Technology

Author:

Hong Ju-Seop,Kim Chan-Soo,Yoo Seung-Wan,Park Seong-Han,Hwang Nong-Moon,Choi Hoo-Mi,Kim Dong-Bin,Kim Tae-Sung

Publisher

Informa UK Limited

Subject

Pollution,General Materials Science,Environmental Chemistry

Link

http://www.tandfonline.com/doi/pdf/10.1080/02786826.2012.725959

Reference31 articles.

1. Morphology Control of Films Formed by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethylorthosilicate/Ozone System

2. Numerical Simulations of Films Formed by Cluster/Particle Co-Deposition in Atmospheric-Pressure Chemical Vapor Deposition Process Using Organic Silicon Vapors and Ozone Gas

3. Particle generation and film formation in an atmospheric-pressure chemical vapour deposition process using tetraethylorthosilicate

4. Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO2Films Using Tetraethylorthosilicate (TEOS)

5. Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O2/He, and TEOS/O3/He Systems

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1. Non-classical Crystallization of Bulk Crystals in Solution and of Thin Films in the Gas Phase by Chemical Vapor Deposition;Electronic Materials Letters;2021-10-18

2. Generation of Charged SiC Nanoparticles During HWCVD Process;Electronic Materials Letters;2020-06-24

3. Effect of Bipolar Charging of SiH4 on the Growth Rate and Crystallinity of Silicon Films Grown in the Atmospheric Pressure Chemical Vapor Deposition Process;Electronic Materials Letters;2020-04-28

4. Application of Cat-CVD Technologies;Catalytic Chemical Vapor Deposition;2019-02-15

5. Influences of hydrogen dilution on the growth of Si-based core–shell nanowires by HWCVD, and their structure and optical properties;Applied Physics A;2016-03

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