Integration of BST thin film for DRAM fabrication-Reference-Cited by-同舟云学术

Integration of BST thin film for DRAM fabrication

Published:1995-11 Issue:1-4 Volume:11 Page:101-109
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Itoh Hiromi¹,Kashihara Keiichirou¹,Okudaira Tomonori¹,Tsunemine Yoshikazu¹,Ohno Yoshikazu¹,Nishimura Tadashi¹,Horikawa Tsuyoshi¹²,Shibano Teruo¹²

Affiliation:

1. a ULSI Laboratory, Mitsubishi Electric Corporation

2. b Semiconductor Research Laboratory , Mitsubishi Electric Corporation

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589508013582

Reference2 articles.

1. Eimori , T. 1993. Technical Digest of the IEDM 93 631

2. Ohno , Y. 1993. Technical Digest of the 1994 Sym. on VLSI Tech. 149

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