Investigation of surface roughness and hillock formation on platinized substrates used for Pt/PZT/Pt capacitor fabrication-Reference-Cited by-同舟云学术

Investigation of surface roughness and hillock formation on platinized substrates used for Pt/PZT/Pt capacitor fabrication

Published:1995-02 Issue:1-4 Volume:7 Page:61-73
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Kneer Emil A.¹,Birnie Dunbar P.¹,Schrimpf R. D.²,Podlesny J. C.³,Teowee G.⁴

Affiliation:

1. a Department of Materials Science and Engineering , University of Arizona , Tucson, AZ, 85721

2. b Department of Electrical and Computer Engineering , University of Arizona , Tucson, AZ, 85721

3. c WYKO Corporation , Tucson, AZ, 85706

4. d Donnelly Corporation , 4545 Fort Lowell Road, Tucson, AZ, 85712

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589508220221

Reference7 articles.

1. Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration

2. Proc. of the 3rd Int. Sym. on Integrated Ferroelectrics;Hren P. D.,1991

3. Revesz , P. Li , J. Szabo , N. Jr. Mayer , J. W. Caudillo , D. and Myers , E. R. 1991.Ferroelectric Thin Films-II, MRS Sym. Proc. Vol. 243, 101–106. Boston

4. Effects of anneal ambients and Pt thickness on Pt/Ti and Pt/Ti/TiN interfacial reactions

5. Bruchhaus , R. Pitzer , D. Eibl , O. Scheithauer , U. and Hoesler , W. 1991.Ferroelectric Thin Films-II, MRS Sym. Proc. Vol. 243, 123–128. Boston

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