Growth and electrical properties of Pb(Zr,Ti)O3 thin films by sputtering using an alloy target
Author:
Affiliation:
1. a Inorganic Materials Research Laboratory, Ube Industries, Ltd. , 1978-5 Kogushi, Ube City Yamaguchi Prefecture, 755, Japan
2. b Department of Electronics, Faculty of Engineering , Kyoto University , Yoshida-Honmachi, Sakyo-ku, Kyoto, 606, Japan
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/10584589408017019
Reference7 articles.
1. Preparation and Properties of Lead Zirconate-Titanate Thin Films
2. Preparation and Switching Kinetics of Pb(Zr, Ti)O3Thin Films Deposited by Reactive Sputtering
3. Metalorganic Chemical Vapor Deposition ofc-Axis Oriented PZT Thin Films
4. Preparation of Pb(Zr, Ti)O3Films on Si Substrate by Laser Ablation
5. Crystallization of Sol Gel Pzt on Aluminium and Platinum Metallizations
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The use of voltage to accelerate the endurance degradation of PZT capacitors;Integrated Ferroelectrics;1997-04
2. Orientation Characteristics with Process Parameters of PLZT(X/70/100) Thin Films Prepared by RF-Magnetron Sputtering;MRS Proceedings;1997
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