Process and properties of Pt/Pb(Zr, Ti)O3/Pt integrated ferroelectric capacitors-Reference-Cited by-同舟云学术

Process and properties of Pt/Pb(Zr, Ti)O3/Pt integrated ferroelectric capacitors

Published:1997-04 Issue:1-4 Volume:16 Page:21-28
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Torii K.¹,Kawakami H.¹²,Miki H.¹,Kushida K.¹,Itoga T.¹,Goto Y.¹,Kumihashi T.¹,Yokoyama N.¹,Moniwa M.¹,Shoji K.¹,Kaga T.¹,Fujisaki Y.¹

Affiliation:

1. a Central Research Laboratory Hitachi, Ltd. , 1-280 Higashi-koigakubo Kokubunji, Tokyo, 185, Japan

2. b Semiconductor Development Center, Hitachi, Ltd. , 1-280 Higashi-koigakubo Kokubunji, Tokyo, 185, Japan

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589708013026

Reference9 articles.

1. Womack , W. 1998. 1998 ISSCC Tech. Digest 242

2. Takenaka , K. 1992. Abstract of 1992 ISIF 61

3. Sumi , T. 1994. 1994 ISSCC Tech. Digest 268

4. Tanabe , N. 1995. 1995 Symp. on VLSI Tech. Digest of Tech. Papers 123

5. Onishi , S. 1994. 1994 IEDM Tech. Digest 843

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhancement in nanoscale electrical properties of lead zirconic titanate island fabricated by focused ion beam;Journal of Applied Physics;2009-02-15

2. PIEZOELECTRIC RESPONSE OF PZT NANOSTRUCTURES OBTAINED BY FOCUSED ION BEAM;Integrated Ferroelectrics;2008-12-09

3. An oxidation barrier layer for metal–insulator–metal capacitors: ruthenium silicide;Thin Solid Films;2003-08

4. Changes in chemical behavior of thin film lead zirconate titanate during Ar+-ion bombardment using XPS;Applied Surface Science;2003-02

5. Formation and oxidation properties of (Ti1−xAlx)N thin films prepared by dc reactive sputtering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-05