Microelements with High Aspect Ratio Prepared by Self-Focusing of Light at UV-Curing
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/15421400802462847
Reference10 articles.
1. Fundamentals of Microfabrication
2. Use of SU-8 photoresist for very high aspect ratio x-ray lithography
3. Optical Surface Making by UV-Curing of Monomeric Compositions in the Near Field of a Coherent Light Source
4. Forming lattices of microlenses by the method of dosed photopolymerization of UV-hardened optical composites
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