The Role of Secondary Electrons in Forming the Image of Electron Nanoprobe-Reference-Cited by-同舟云学术

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The Role of Secondary Electrons in Forming the Image of Electron Nanoprobe

Published:2008-09 Issue:5-6 Volume:16 Page:682-686
ISSN:1536-383X
Container-title:Fullerenes, Nanotubes and Carbon Nanostructures
language:en
Short-container-title:Fullerenes, Nanotubes and Carbon Nanostructures

Author:

Nevedomsky V. N.,Mikoushkin V. M.,Nashchekin A. V.,Gordeev Yu. S.,Konnikov S. G.,Solonitsina A. P.,Makarets N. V.,Prylutskyy Yu. I.

Publisher

Informa UK Limited

Subject

Organic Chemistry,Physical and Theoretical Chemistry,General Materials Science,Atomic and Molecular Physics, and Optics

Link

http://www.tandfonline.com/doi/pdf/10.1080/15363830802317031

Reference6 articles.

1. Nanolithography Using Fullerene Films as an Electron Beam Resist

2. C60Resist Mask of Electron Beam Lithography for Chlorine-Based Reactive Ion Beam Etching

3. Two-dimensional photonic crystal fabrication using fullerene films

4. Rectangular lattices of permalloy nanoparticles: Interplay of single-particle magnetization distribution and interparticle interaction

5. Fullerite C60 as electron-beam resist for ‘dry’ nanolithography

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