The doping efficiency in amorphous silicon and germanium
Author:
Affiliation:
1. a Xerox Palo Alto Research Center , Palo Alto , California , 94304 , U.S.A.
2. b Max-Planck-Institut für Festkörperforschung , Heisenbergstrasse 1, D-7000, Stuttgart , 80 , F. R. Germany
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642818608238962
Reference15 articles.
1. Local bonding arrangements of boron in doped hydrogenated amorphous silicon
2. Direct measurement of gap-state absorption in hydrogenated amorphous silicon by photothermal deflection spectroscopy
3. Theory of defect formation in the glow-discharge deposition of phosphorus-doped hydrogenated amorphous silicon
4. Coordination of Arsenic Impurities in Amorphous Silicon-Hydrogen Alloys
5. The incorporation of phosphorus in amorphous silicon
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