Influence Sputtering Conditions on Electrical Characteristics of Si-LiNbO3Heterostructures Formed by Radio-Frequency Magnetron Sputtering
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/15421406.2014.967607
Reference37 articles.
1. Microstructure development of sol-gel derived epitaxial LiNbO3 thin films
2. Pulsed laser deposition of stoichiometric LiNbO3 thin films by using O2 and Ar gas mixtures as ambients
3. Liquid‐phase‐epitaxial growth of single‐crystal LiNbO3thin film
4. The growth of thin films of lithium niobate by chemical vapour de position
5. Investigation of LiNbO3 thin films grown on Si substrate using magnetron sputter
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2. Effect of reactive gas composition on properties of Si/LiNbO3 heterojunctions grown by radio-frequency magnetron sputtering;Journal of Science: Advanced Materials and Devices;2020-12
3. Early stages of lithium niobate films growth fabricated by radio-frequency magnetron sputtering on crystalline (001)Si and amorphous carbon substrates;Surfaces and Interfaces;2020-06
4. Oxide charge evolution under crystallization of amorphous Li–Nb–O films;Journal of Science: Advanced Materials and Devices;2020-06
5. Effective Charge in LiNbO3 Films Fabricated by Radio-Frequency Magnetron Sputtering Method;Physics of the Solid State;2019-12
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