Properties of ITO (Indium Tin Oxide) Film Deposited by Ion-Beam-Assisted Sputter-Reference-Cited by-同舟云学术

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Properties of ITO (Indium Tin Oxide) Film Deposited by Ion-Beam-Assisted Sputter

Published:2012-09-19 Issue:1 Volume:564 Page:185-190
ISSN:1542-1406
Container-title:Molecular Crystals and Liquid Crystals
language:en
Short-container-title:Molecular Crystals and Liquid Crystals

Author:

Lee Sung Ho,Cho Sang Hyun,Kim Hyo Jin,Kim Sung Hong,Lee Sang Geul,Song Kyu Ho,Song Pung Keun

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

http://www.tandfonline.com/doi/pdf/10.1080/15421406.2012.691772

Reference15 articles.

1. Effects of Ca Doping on Nodule Formation of on ITO Target during DC Magnetron Sputtering

2. Carbon encapsulated nickel nanoparticles synthesized by a modified alcohol catalytic chemical vapor deposition method

3. Magnetron sputtering: a review of recent developments and applications

4. Synthesis and field emission of patterned ZnO nanorods

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1. Effect of in layer thickness on the photoelectric properties of indium tin oxide (ITO)/In/ITO multilayer films;Thin Solid Films;2024-01

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5. A Lateral MOS-Capacitor-Enabled ITO Mach–Zehnder Modulator for Beam Steering;Journal of Lightwave Technology;2020-01-15

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