Kinetics of metastability in doped hydrogenated amorphous silicon

Author:

Nebel C. E.1,Street R. A.1,Jackson W. B.1,Johnson N. M.1

Affiliation:

1. a Xerox Palo Alto Research Center , Palo Alto , California , 94304 , USA

Publisher

Informa UK Limited

Subject

General Physics and Astronomy,General Chemical Engineering

Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Study of thermal equilibration in selenium- and sulphur-doped a-Si:H;International Journal of Electronics;2003-07

2. Progress of ICC α-cell microbolometer development program;SPIE Proceedings;2003-01-01

3. ICC silicon microbolometer development program;Infrared Technology and Applications XXVII;2001-10-10

4. Current-induced instability in Cr–p+ a-Si:H–V thin film devices;Philosophical Magazine B;2000-01

5. Hydrogen motion and stretched-exponential relaxation in a-Si:H;Journal of Physics: Condensed Matter;1998-07-06

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