Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://www.tandfonline.com/doi/pdf/10.1080/00150193.2016.1235453
Reference31 articles.
1. Scaling behavior and structure transition of ZrO2 films deposited by RF magnetron sputtering
2. Properties of ZrO2 dielectric layers grown by metalorganic molecular beam epitaxy
3. Structure and thermal stability of MOCVD ZrO2 films on Si (100)
4. Preparation and characterization of ZrO2 thin film on sulfonated self-assembled monolayer of 3-mercaptopropyl trimethoxysilane
5. Ambient temperature stabilization of crystalline zirconia thin films deposited by direct current magnetron sputtering
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