Etching mechanism of LiTaO3 crystals in CHF3/Ar plasma
Author:
Affiliation:
1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, China
Funder
Science and Technology Department of Sichuan Province
Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/00150193.2021.1951032
Reference17 articles.
1. A spurious-free, steep band rejection filter using a LiTaO3/quartz heteroacoustic layer surface acoustic wave resonator
2. Wafer-Scale Fabrication of 42° Rotated Y-Cut LiTaO3-on-Insulator (LTOI) Substrate for a SAW Resonator
3. Femtosecond Laser Writing of Optical Waveguides by Self-Induced Multiple Refocusing in LiTaO3 Crystal
4. Second harmonic generation of femtosecond laser written depressed cladding waveguides in periodically poled MgO:LiTaO3 crystal
5. The modulation to Cerenkov second-harmonic in a LiTaO3waveguide with annular poling domain
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Investigation of Structural and Dielectric Properties of Mg Substituted LiTaO3 Ceramics;Russian Journal of Inorganic Chemistry;2023-12
2. Inductively coupled plasma etching of LiTaO3 in CHF3/Ar plasmas;Ferroelectrics;2022-11-18
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