Structural and Chemical Study of a‐BC, a‐CN, and a‐BCN Thin Films Prepared by Reactive RF Sputtering-Reference-Cited by-同舟云学术

Structural and Chemical Study of a‐BC, a‐CN, and a‐BCN Thin Films Prepared by Reactive RF Sputtering

Published:2008-03-01 Issue:2 Volume:41 Page:57-63
ISSN:0038-7010
Container-title:Spectroscopy Letters
language:en
Short-container-title:Spectroscopy Letters

Author:

Essafti A.¹,Ech‐chamikh E.¹,Azizan M.¹

Affiliation:

1. a Laboratoire de Physique des Solides et des Couches Minces, Département de Physique, Faculté des Sciences‐Semlalia‐ , Université Cadi Ayyad , Marrakech, Morocco

Publisher

Informa UK Limited

Subject

Spectroscopy,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Link

https://www.tandfonline.com/doi/pdf/10.1080/00387010801938228

Reference23 articles.

1. Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes

2. Sputter deposition of high resistivity boron carbide

3. Prediction of New Low Compressibility Solids

4. Optical characterization of a-C:N thin films deposited by RF sputtering

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High thermal conductivity of orthorhombic BC2N semiconductor: DFT study of electronic, phonon, AIMD, and optical properties;Diamond and Related Materials;2024-10

2. A short note on the development of thin film using sputtering process;AIP Conference Proceedings;2024

3. Review on various techniques for the development of thin film boron nitride coating on metal surfaces;AIP Conference Proceedings;2024

4. Thermodynamic Characterization of Volatile Alkylamine Boranes as Precursors for the Formation of BCxNy Films;Russian Journal of Inorganic Chemistry;2023-02

5. Thermodynamic Characterization of Volatile Alkylamine Boranes as Precursors for the Formation of BCxNy Films;Журнал неорганической химии;2023-02-01