Rapid Thermal Process for Crystallization Silicon Nitride Films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Rapid Thermal Process for Crystallization Silicon Nitride Films

Published:2019-01-11 Issue:5 Volume:36 Page:456-464
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Meziani Samir¹,Moussi Aberrahmane¹,Mahiou Linda¹,Antoni Frederic²,Outemzabet Ratiba³

Affiliation:

1. Division DDCS, Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique CRTSE, Alger, Algeria

2. Laboratoire ICube – Département DESSP (UMR7357 CNRS/UNISTRA), Strasbourg, France

3. Laboratoire des semi-conducteurs et oxydes métalliques, Université des Sciences et de la Technologie Houari Boumediene., Alger, Algérie

Funder

National Research Fund DGRSDT

Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1080/02670844.2018.1564199

Reference35 articles.

1. Efficiency enhancement of silicon solar cells with silicon nanocrystals embedded in PECVD silicon nitride matrix

2. Si nanocrystal based memories: Effect of the nanocrystal density

3. Annealing temperature dependence of photoluminescent characteristics of silicon nanocrystals embedded in silicon-rich silicon nitride films grown by PECVD

4. Quantum confinement effect in crystalline silicon quantum dots in silicon nitride grown using SiH4 and NH3

5. Effect of annealing treatments on photoluminescence and charge storage mechanism in silicon-rich SiN x :H films

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simplified CVD route to near-zero thickness silicon nitride films;Journal of Vacuum Science & Technology B;2022-07

2. The low-temperature remote-plasma-activated pulsed chemical vapor deposition route to SiNx from 1,3,5-tri(isopropyl)cyclotrisilazane;Thin Solid Films;2020-10

3. Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications;ECS Journal of Solid State Science and Technology;2020-01-08

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3