Comparative study on structure and properties of ZnO thin films prepared by RF magnetron sputtering using pure metallic Zn target and ZnO ceramic target
Author:
Affiliation:
1. School of Mechanical Engineering, Shaanxi University of Technology, Hanzhong, People’s Republic of China
2. Precision Electrical and Mechanical Division, Horological Research Institute of Light Industry, Xi’an, People’s Republic of China
Funder
Science and Technology Department of Shaanxi Province of China
Shaanxi Provincial Education Department Key Scientific Research Project of Key Laboratory of China
Shaanxi University of Technology Fund Project of China
Publisher
Informa UK Limited
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://www.tandfonline.com/doi/pdf/10.1080/02670844.2018.1555214
Reference28 articles.
1. Doping Ga effect on ZnO radio frequency sputtered films from a powder target
2. Substrate polarity and surface pretreatment temperature dependence of ZnO homoepitaxy
3. Crystallographic polarity effect of ZnO on thin film growth of pentacene
4. Polarity in GaN and ZnO: Theory, measurement, growth, and devices
5. Influence of crystallographic polarity on the opto-electrical properties of polycrystalline ZnO thin films deposited by magnetron sputtering
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