Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering-Reference-Cited by-同舟云学术

Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering

Author:

Tian Wu¹²,Dai Jiaoyan²^ORCID,Zhang Lijun²³,Chang Yongqiang²⁴,Bao Mingdong²,Yu Shengwang¹

Affiliation:

1. Institute of New Carbon Materials, Taiyuan University of Technology, Taiyuan City, People’s Republic of China

2. School of Materials and Chemical Engineering, Ningbo University of Technology, Ningbo City, People’s Republic of China

3. School of Materials Science and Engineering, Chang'an University, Xi’an City, People’s Republic of China

4. College of Mechanical Engineering, Taiyuan University of Technology, Taiyuan City, People’s Republic of China

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

Reference34 articles.

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