Plasma CVD techniques for ceramic coating
Author:
Publisher
Informa UK Limited
Subject
Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Link
http://www.tandfonline.com/doi/pdf/10.1080/09507118809447561
Reference8 articles.
1. The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x
2. Thin Film No. 131 Committee of Nippon Gakujutsu Shinkokai: ‘Thin Film Handbook’ (Omu Sha)
3. Yasui, Hirose and Ichihara:Metal1984 49
4. Preparation of titanium nitride films by plasma-enhanced chemical vapor deposition (II)
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