Impact of heavy-ion irradiation on gate oxide reliability of silicon carbide power MOSFET

Author:

Liang Xiaowen12,Zhao Jinghao123,Zheng Qiwen1,Cui JiangWei1,Yang Sheng12,Wang Baoshun12,Zhang Dan1,Yu XueFeng1,Guo Qi1

Affiliation:

1. Key Laboratory of Functional Materials and Devices for Special Environments, Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi, China

2. University of Chinese Academy of Sciences, Beijing, China

3. Department of Electrical Engineering-Advanced Integrated Sensing Lab, Katholieke Universiteit Leuven, Leuven, Belgium

Funder

West Light Foundation

Chinese Academy of Sciences

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,General Materials Science,Nuclear and High Energy Physics,Radiation

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Radiation-induced degradation of silicon carbide MOSFETs – A review;Materials Science and Engineering: B;2024-02

2. Ionization Radiation-Induced Reliability Degradation of SiC Power MOSFET;IEEE Transactions on Electron Devices;2023-12

3. Study of heavy ion induced single event gate rupture effect in SiC MOSFETs;Japanese Journal of Applied Physics;2022-07-27

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