Characterization of RF Sputter-Deposited Ultra Thin PZT Films and Its Interface With Substrate-Reference-Cited by-同舟云学术

Characterization of RF Sputter-Deposited Ultra Thin PZT Films and Its Interface With Substrate

Published:2010-11-12 Issue:1 Volume:120 Page:37-48
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Bose A.¹,Bysakh Sandip¹,Mukherjee M.²,Islam A. K. M. Maidul²,Balamurugan A. K.³,Sen Suchitra¹

Affiliation:

1. a Analytical Facility Division , Central Glass & Ceramic Research Institute , CSIR 196, Raja S. C. Mullick Road, Kolkata, 700032, India

2. b Surface Physics Division , Saha Institute of Nuclear Physics , Kolkata, 700064, India

3. c IGCAR , Kalpakkam, India

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584587.2010.491726

Reference19 articles.

1. Ceramic Thin Films: Fabrication and Applications

2. Laser-Ablation Deposition and Characterization of Ferroelectric Capacitors for Nonvolatile Memories

3. Science and technology of ferroelectric films and heterostructures for non-volatile ferroelectric memories

4. Ferroelectric Field Effect Transistor Based on Epitaxial Perovskite Heterostructures

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