Author:
Th. Lindgreen R. J.,Boerma D. O.,De Hosson J. Th. M.
Cited by
9 articles.
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1. Peening in ion-assisted thin-film deposition: a generalized model;Journal of Physics D: Applied Physics;1994-05-14
2. Depth selective microstructural analysis of ion implanted metals by cross-section transmission electron microscopy and computer simulation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-03
3. Removal processes for damage and contamination after CF4/40%H2 reactive ion etching of silicon;Microelectronics Journal;1987-09
4. Aluminium implantations in copper;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1987-01
5. Effect of crystal orientation on sputtering and lattice damage in ion-irradiated copper;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1987-01