Range calculations at high ion energy-part I
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337578808229946
Reference11 articles.
1. Application of the Boltzmann transport equation to calculations of flux and range distributions of energetic ions
2. Energy deposition and penetration depth of heavy ions in the electronic stopping region
3. Ranges of energetic ions in matter
4. Range distributions of energetic ions
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1. On the use of the backward Fokker–Planck equation to calculate range profiles;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-09
2. Distribution of implanted impurities and deposited energy in high-energy ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-05
3. Distributions of the implanted impurity and energy release in high-energy ion implantation;Technical Physics;1997-01
4. Electronic structures of N2+ and O2+ ion-implanted Si(100);Surface and Interface Analysis;1995-06
5. Calculation of the backscattered ion energy and angular distributions during the grazing implantation;Vacuum;1995-04
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