Simulation of resist exposure and development on topographic substrates
Author:
Publisher
Informa UK Limited
Subject
Electrical and Electronic Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00207219408925928
Reference11 articles.
1. Optical lithography simulation: Introduction to SPESA
2. Modeling projection printing of positive photoresists
3. ANKAN : Simulator for Resist Exposure and Etching
4. JEWETT , R. , 1979 , A string model etching algorithm . Memo No. UCB/ERL M79/68 , University of California , Berkeley .
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Modelling of resolution enhancement processes in lithography;Microelectronics Journal;1997-01
2. SLITS simulator: modeling and simulation of e‐beam/deep‐ultraviolet exposure and silylation;Optical Engineering;1996-01-01
3. TOPOGRAPHY SIMULATION IN PHOTOLITHOGRAPHY USING FINITE ELEMENT ANALYSIS AND A MODIFIED STRING ALGORITHM;COMPEL - The international journal for computation and mathematics in electrical and electronic engineering;1994-04
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