Excimer Laser Induced Removal of Particles from Hydrophilic Silicon Surfaces

Author:

Wu X.,Sacher E.,Meunier M.

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,General Chemistry

Reference29 articles.

1. Kern, W. and Tolliver, D. 1993.Handbook of Semiconductor Wafer Cleaning Technology, Edited by: Kern, W. 3Park Ridge, New Jersey: Noyes Publications. 68 and 595

2. The Evolution of Silicon Wafer Cleaning Technology

3. Bardina, J. 1988.Particles on Surfaces, Edited by: Mittal, K. L. Vol. 1, 329New York: Plenum.

4. Dust Busters

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